{"id":23304,"date":"2026-08-12T11:00:00","date_gmt":"2026-08-12T11:00:00","guid":{"rendered":"https:\/\/scannn.com\/samsung-foundry-updates-process-roadmap-to-move-1-4nm-node-to-2029-high-na-euv-will-enable-1nm-class-and-smaller-nodes-in-2030-and-beyond\/"},"modified":"2026-08-12T11:00:00","modified_gmt":"2026-08-12T11:00:00","slug":"samsung-foundry-updates-process-roadmap-to-move-1-4nm-node-to-2029-high-na-euv-will-enable-1nm-class-and-smaller-nodes-in-2030-and-beyond","status":"publish","type":"post","link":"https:\/\/scannn.com\/lv\/samsung-foundry-updates-process-roadmap-to-move-1-4nm-node-to-2029-high-na-euv-will-enable-1nm-class-and-smaller-nodes-in-2030-and-beyond\/","title":{"rendered":"Samsung Foundry updates process roadmap to move 1.4nm node to 2029 \u2014 high-NA EUV will enable 1nm-class and smaller nodes in 2030 and beyond"},"content":{"rendered":"\n
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Samsung Foundry presented its updated fabrication technologies roadmap at the 2026 Next-Generation Lithography + Patterning Conference (NGL 2026) this week, revealing some major changes compared to the 2024 roadmap<\/a>, reports ZDNet Korea<\/a>. Instead of rushing its SF1.4 node (1.4nm-class) to the market, Samsung will focus on refining its SF2 (2nm-class) manufacturing processes in the next three years. And starting with its SF1A (1nm-class) fabrication node, Samsung intends to adopt High-NA EUV lithography tools, the first time the company confirms the plan.<\/p>\n

Before moving on to 10-angstrom (or 1nm-class) node around 2030, Samsung will refine its SF2-series manufacturing technologies (which includes SF2P, SF2X, SF2A, and SF2Z with backside power delivery) and introduce its SF1.4 process in 2029.<\/p>\n

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